Strategic Alliance Produces 100 nm MPU
-- Semiconductor International, 3/1/1999
PowerPC microprocessors with 100 nm features have been
successfully fabricated at Motorola's MOS 13 fab in Austin, Texas. Operating at
> 450 MHz, the ICs were processed using a standard 0.18 µm production method.
248 nm DUV light and photomasks implementing both phase-shifting and optical
proximity correction (OPC) techniques were used to image subwavelength
linewidths. Production of 100 nm devices is targeted for the end of the year.
To extend usability of current technologies to next-generation devices,
Motorola has entered into a strategic alliance with Numerical Technologies
(NumeriTech, Santa Clara, Calif.). Using 248 nm illumination for sub-0.18 µm
features poses inherent limitations. NumeriTech claims this can be addressed at
the mask level and more importantly at design layout and verification levels
through integration of OPC and phase-shifting technologies throughout the
process. Motorola has incorporated NumeriTech's software into its production
design and fabrication processes to produce additional subwavelength ICs.
