Crolles Reaches 0.15 µm Feature Size
Staff -- Semiconductor International, 6/1/1998
The SGS-Thomson Microelectronics fab at Crolles (Grenoble, France) will start to prototype devices using its 0.18 µm (180 nm) process with copper tracks this year. This HCMOS-8 process will be one of the most advanced in the world, with minimum feature sizes of only 0.15 µm (150 nm). Crolles hasalready started to produce devices on its 0.25 µm (250 nm) line, which will ramp up to high-volume levels during the course of this year. Joel Monnier, vice-president of research and development, said, "We are one of the first companies in the world to reach these levels of process development."
