Polcari to Call for EUV Infrastructure
At the SPIE/BACUS Photomask Symposium, Sematech CEO Mike Polcari will give a keynote speech on the need for industry collaboration to develop an EUV mask infrastructure. The symposium is planned for Sept. 14-17 in Monterey, Calif.
Staff -- Semiconductor International, 9/1/2009
Sematech CEO Michael Polcari will discuss the EUV mask infrastructure issue at the SPIE/BACUS Photomask Symposium, planned for Sept. 14-17 in Monterey, Calif.
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Mike Polcari, CEO, Sematech |
In his Sept. 15 keynote, Polcari will discuss global collaboration in the mask industry, including how a collaborative strategy is required to develop EUV metrology tools.
"Although we recognize that there are multiple technologies to meet the semiconductor industry's ever-growing lithography demand, we believe EUV can be the cost-effective solution," Polcari said. "A mask infrastructure must be available to address the growing demand for high-resolution, low-cost-of-ownership lithography."
Other planned Sematech presentations include a mask industry assessment by Greg Hughes and Henry Yun. Sudharshanan Raghunathan and John Hartley of the University at Albany, along with Jaewoong Sohn and Kevin Orvek of Sematech, will present on the reticle substrate non-flatness effects in EUV lithography; and another Sematech-supported team will discuss the impact of carbon contamination on EUV masks.
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EUV metrology tools will require a collaborative effort, according to Sematech. |
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EUVL tpt is 4wph@5mJ/cm2 and that is good progress for us.
ASML - 9/11/2009 11:31:01 AM CDT -
2013 is too late for Intel and Samsung, they would be developing their 11 nm by then, having already ironed out hyperextended 193 nm lithography with existing infrastructure.
cannot believe it - 9/1/2009 6:47:32 PM CDT
