Dual-Track Sokudo Duo Boosts Throughput
Sokudo announced a dual-track system, the Sokudo Duo, aimed at boosting throughput of the coat, develop and bake steps to 250-300 wph. Sokudo said the system can support litho cells performing double patterning with ArF immersion scanners.
Staff -- Semiconductor International, 4/21/2009
In a move to boost throughputs at high-volume megafabs, Sokudo Co. Ltd. (Kyoto, Japan) unveiled a dual-track design that pushes throughputs to 250-300 wph. The track system also protects fabs against downtime, the company said, by allowing one track to continue in operation if the second is down for repairs.
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| The Sokudo Duo increases track system throughputs to 250-300 wph. |
The Sokudo Duo coater-developer is the first major track platform created by the joint venture formed in July 2006 by Applied Materials Inc. (Santa Clara, Calif.) and Dainippon Screen Mfg. Co. Ltd. (Kyoto). While other track systems have boosted throughput to 150-180 wph by speeding up wafer handling, the Sokudo Duo actually reduces the wafer-handling speed, which the company said improves system reliability.
The dual-track system improves wafer output per unit area by ~40% compared with previous track systems, and provides a reduced footprint. The system features integrated wafer-cleaning options to maintain high yield and extend maintenance intervals of the scanner's wafer chuck.
The tool supports immersion ArF double patterning, and arrives as semiconductor vendors face lithography throughput challenges during double patterning steps. "Results from several semiconductor manufacturer installations in Japan and Asia have already confirmed the system's high productivity performance," said newly installed Sokudo CEO Tadahiro Suhara.
Annual lithography breakfast continues
The company also said it will put on its annual lithography breakfast at SEMICON West 2009. The 16th lithography breakfast forum, scheduled for July 15, includes presentations by representatives of the three largest scanner vendors, as well as by lithography managers from major device makers. The company said invitations will go out in late May or early June for the invitation-only event, which will focus on efforts to boost throughputs for double-patterning lithography.
