Optical Lens Material

By Semiconductor International Staff -- Semiconductor International, 5/1/2006

HPFS 8650 is a high-purity optical lens material for microlithography designed to support the performance requirements of polarized 193 nm immersion lithography systems. It exhibits high resistance to laser damage at 193 nm, low compaction, no expansion, and low polarization-induced birefringence. Features include improved index homogeneity, low initial birefringence with no systematic pattern, and high transmission. Corning Inc., Corning, N.Y., www.corning.com.

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