ASM, Hitachi Kokusai Sign ALD Licensing Agreement
Staff -- Semiconductor International, 11/27/2007
ASM International NV (Bilthoven, Netherlands) said Tuesday (Nov. 27) that it has licensed its atomic layer deposition (ALD) patents, including those related to batch ALD, to Hitachi Kokusai Electric Inc. (Tokyo).
Terms of the agreement were not disclosed.
Shoichiro Izumi, general manager of Hitachi Kokusai Electric, said the Japanese company has been developing and selling batch ALD equipment for some time, and that the patent agreement “will contribute to our customers’ advantage.”
ASM said in a press release that it owns a “substantial” patent portfolio in the field, including patents related to multiple wafer ALD processing in a vertical furnace, which can provide “significant cost-of-ownership benefits for various ALD applications.”
Albert Hasper, general manager of ASM, said, “We are pleased that Hitachi Kokusai Electric recognized the value of this IP portfolio and that we have reached this agreement in a professional and business manner to the benefit of both companies. We believe it is in the best interest of the semiconductor industry to license this technology and allow another supplier to join us in serving the rapidly growing need for cost-effective ALD processing capabilities.”
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