Bilayer Photoresist

By Semiconductor International Staff -- Semiconductor International, 1/1/2008

This silicon-infused bilayer photoresist uses silicon polymer in the imaging layer to provide advanced etch selectivity. This enables the use of thinner photoresist layers, improving pattern resolution and allowing for smaller patterns to be transferred onto target wafers without pattern collapse issues. It can be used for both dry and immersion lithography. Tokyo Ohka Kogyo Co. Ltd., Tokyo,www.tok.co.jp; Dow Corning Corp., Midland, Mich.,www.dowcorning.com

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