Audio Interview: Experts Tackle Surface Cleaning Challenges
Peter Singer, Editor-in-Chief -- Semiconductor International, 11/10/2006
At the Surface Cleaning Workshop in Boston, Editor-in-Chief Pete Singer talked to Ahmed A. Busnaina about challenges in wafer cleaning, and the launch of a new Surface Cleaning User’s Group, modeled after a similar program in Korea. Busnaina hails from Northeastern University, where he is the William Lincoln Smith Professor and Director of the NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing and the NSF IUCRC Center for Microcontamination Control. He is also the organizer of the Surface Cleaning Workshop.
Listen to the audio interview (Runtime: 11:37)
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