Sematech and Asahi Glass Partner on EUV Mask Blanks
Sematech and Asahi Glass Co. will work together in Albany, N.Y., on mask blanks for EUV lithography. One goal is to reduce mask blank defects to the 0.003/cm2 level.
Staff -- Semiconductor International, 2/25/2009
Sematech and Asahi Glass Co. (Tokyo) said they have formed a joint development partnership to accelerate mask blank commercialization for EUV lithography.
Sematech and Asahi Glass will collaborate at the EUV Mask Blank Development Center at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany on methods for improving extreme ultraviolet (EUV) mask blank yields. One goal is to reduce mask blank defects to 0.003/cm2 at the printable defect size. “Sematech and AGC have already shared a great deal of technical success through collaboration over the past several years,” said Mitsuhiko Komakine, manager of Asahi Glass’s EUV mask blank development group. Asahi Glass is a vertically integrated EUV blank manufacturer, starting with the low thermal expansion (LTE) material, to EUV mask blanks, deposited films and resists.
John Warlaumont, vice president of advanced technologies at Sematech, said the move will “minimize this technology’s time to manufacturing readiness.”
The mask blank infrastructure issue has taken on increasing importance since Schott Lithotec (Jena, Germany) shut down its EUV mask blank development effort several years ago.
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A defect-free 8" wafer is easier.
defector - 2/26/2009 10:00:00 AM CST -
Give it up already.
guest - 2/25/2009 10:00:00 PM CST
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