German Ministry Funds Mask Project
The German government will fund a mask development project aimed at 32/22 nm masks, with participation by the Advanced Mask Technology Center, Vistec Semiconductor and the German Metrology Institute. The goal is to develop mask technologies for 32 nm memories and 22 nm microprocessors.
Staff -- Semiconductor International, 9/4/2008
The German Federal Ministry of Education and Research said it is funding the Critical Dimension and Registration for 32 nm Mask Lithography (CDuR32) cooperative project with a budget of 16.7 million euros ($25M).
The project partners include the Advanced Mask Technology Center (AMTC, Dresden, Germany), Vistec Semiconductor Systems GmbH (Weilburg, Germany), and the German Metrology Institute (Braunschweig, Germany). During the next 2.5 years, the partners will cooperate in the development of technologies and measurement processes for mask technologies for 32 nm memories and 22 nm microprocessors.
Each of the three project partners has specific roles:
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AMTC is developing the basic principles of manufacturing 32/22 nm masks.
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Vistec is developing a next-generation mask measurement system, the LMS IPRO5.
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The German Metrology Institute will contribute mathematical analysis methods, including the definition and characterization of the necessary measurement and calibration guidelines.
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