ICP Strip

SEMICON China Preview

Staff -- Semiconductor International, 2/1/2004

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The Aspen III ICP Strip system features a proprietary inductively coupled plasma (ICP) source that effectively strips the resist and residue, reducing the need for post-strip chemical processing. The system achieves excellent results for high-dose implant strip, residue removal and surface cleaning for advanced applications, including low-k, and oxygen- and non-oxygen-based processes. It offers advanced technology on a high-throughput platform. Mattson Technology Inc., www.mattson.com. Booth 6423

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