Stepper Reticle

Staff -- Semiconductor International, 6/1/1999

This reticle allows tool matching using a single test reticle. This technology provides the tightest match between two different types of tools, even those from different manufacturers. The two reticles were designed to allow pattern overlay on the same wafer, giving a foundation for stage precision, X and Y stage scaling, baseline and microscope rotation measurements. It enables grid and field matching errors. The data can be saved in a reference standard database for statistical analysis and for future matching and calibration.

Talkback

We would love your feedback!

Microclean

02/09/2010

Fab Equipment e-Diagnostics

10/31/2001

Wafer Inspection System

04/30/2002

TOC Detection Technology

06/30/1999

Wire Bonder

07/01/2002

Also by this author

»MORE

Featured Company

Technical Manufacturing Corporation

TMC designs and manufactures precision vibration isolation systems for sensitive research and manufacturing processes worldwide. The ISO 9001:2008-certified company's products are industry standards in semiconductor manufacturing, life sciences and... more

Most Recent Resources

STACIS® SEM-Base™ Active Vibration Cancellation Floor Platform for...

Sematech’s New President Looks for Increased Collaboration

Daniel Armbrust has been appointed president and CEO of Sematech, succeeding Michael Polcari, who is now that industry organization's chairman of the board. In this month's podcast interview, Armbrust, who was most recently responsible for the operation of IBM's 300 mm fab in East Fishkill, N.Y., discusses his plans for Sematech, R&D funding, and the need for closer cooperation among semiconductor industry organizations.

The Coming of EUV Lithography – When?

Senior Editor Alexander E. Braun interviews Toppan Photomasks CTO Franklin Kalk at the SPIE Photomask conference about the status of lithography in general and EUV lithography development in particular. Kalk believes considerable work and development still remain to be done for EUV to become a mainstream reality.

VIEW ALL PODCASTS