Semiconductor International - September 01, 2008

Flash memory is accelerating the push for continued scaling, and hyper-NA immersion lithography has brought 45 nm and below imaging within reach. Several mask parameters are important for imaging performance, and mask-level aerial imaging is useful for characterizing that performance before exposure.

• Departments
• Editorial
• Looking for Truth in Conferences
• Expert Perspectives
• Profitless Prosperity
• New Products
• Advanced Substrates
• Surface Profiler System
• Gas Extension Control System
• Tunable Laser System
• Resist Strip/Residue Clean System
• Line Heater System
• CVD Hard Mask
• Automated MBE System
• PTFE Coating
• Standalone Platform
• Solar Software
• TSV Bonding Solution
• SEM Analysis
• Surface-Mount Devices
• Gap Fill System
• Electrochemical Process

• Features
• Fine-Tuning CMP
• How Pump-Induced Particles Affect Low-k CMP Defectivity
• Self-Aligned Double Patterning Gains NAND Flash Favor

• Special Report
• Equipment Components and Subsystems
• Treating Copper CMP Wastewater
• Concentration Sensors Curb Rising CoO
• Keep Rolling With New Bearing Technologies