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  • Penn State graphene TS

    Penn State Synthesizes Graphene Wafer


    Penn State researchers have produced 100 mm graphene wafers, crucial for the development of graphene-based high-frequency devices. The researchers are initially focusing on graphene materials to improve transistor performance in various RF applications.  More
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Driving Down the Cost of TSVs

The race to drive down the cost of through-silicon vias (TSVs) is on, with new cost targets in clear view. Industry...


Litho Cell Efficiency Enables Continuing Cost Reduction

EUV Resists Designed for Low Acid Diffusion



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  • FormFactor Opens Singapore Plant

    FormFactor will manufacture wafer probe cards at the new site in Singapore, which will also serve as a global business center.
  • IMEC, Synopsys to Co-Develop 3-D Stacked ICs

    IMEC will use Synopsys TCAD tools in a collaboration to address reliability and performance concerns in through-silicon via (TSV) technology.
  • Process Control, Yield Management in HB-LED Manufacturing

    HB-LED TS With the explosive growth in high-brightness LED (HB-LED) applications including backlighting and general illumination, device manufacturers are increasing focus on improved device performance and reduced manufacturing costs. In-line inspection during device fabrication significantly increases LED performance through improved process control and allows device makers to achieve cost savings through higher yields.
  • Gartner Sees ‘Spurt' in Capex Spending

    Gartner said wafer fab equipment and packaging and assembly equipment both will see ~76% growth this year, led by memory companies making the technology transition to DDR3 DRAMs. Capex may slow down slightly later this year before picking up again going into 2011, analyst Jim Walker said.

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Chipworks Inside Angle

Dick James, Senior Technology Analyst
March 8, 2010
Energy Audits by MEMS
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Perspectives From the Leading Edge

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March 3, 2010
IC Consolidation, Node Scaling and 3D IC
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Vivek Bakshi

EUVL Focus

Vivek Bakshi, EUV Litho Inc.
February 17, 2010
Picking the Winning NGL Technology
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Alain Diebold

Line and Rule

Alain Diebold, College of Nanoscale Science and Engineering (CNSE)
February 10, 2010
ICSE-V: The Fifth International Conference on Spectroscopic Ellipsometry
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  • EUV Litho Still on the Defensive


    At the 2010 SPIE Advanced Lithography conference, Senior Editor Alexander E. Braun interviews Ron Kool, vice president and manager of ASML's EUV Business Unit, about the state of the much-delayed EUV litho development, and ongoing efforts to extend 193 nm immersion to 16 nm and well beyond. Hear It Now
  • SRC Chief Urges Beyond-CMOS, PV Technology Roadmaps


    Larry Sumney, president, CEO and chairman of the board of Semiconductor Research Corp., gives his views on the state of semiconductor research in the United States and worldwide, and about the necessity to establish technology roadmaps for beyond-CMOS and photovoltaic technologies. Hear It Now
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